Cathodic Arc Deposition System

Cathodic Arc Deposition System

Cathodic arc plasma deposition is one of the oldest and one of the most modern, emerging technologies. Over the last two decades it has become the technology of choice for hard, wear resistant coatings on cutting and forming tools, corrosion resistant and decorative coatings on door knobs, shower heads, jewelry, and many other substrates.

Cathodic Arc Deposition process based on low-voltage, high current cathodic arc physics that produce dense, highly ionized plasma. It works under vacuum conditions using specially designed deposition heads. Cathodic Arc Deposition can be operated in either DC or pulsed modes. In either case, a power supply applies a voltage which produces an arc discharge between an anode and cathode. The arc current is concentrated over a small surface area on the cathode which creates an extremely high current density at what are generally called “cathode spots”.

This high current density is associated with an extremely high power density that produces a localized phase transformation of the solid target (the cathode material) to almost fully ionized deposition plasma. The plasma expands rapidly into the ambient vacuum towards the substrate.

At the time of deposition on the substrate, the plasma has ion velocities with kinetic energies of about 20 eV for light elements and 200 eV for heavy elements. This can be compared to sputtering, where the energy is a few eV at most.  

There are a number of advantages to the higher ion energies associated with Cathodic Arc Deposition. For example, Cathodic Arc Deposition films tend to be denser and have better adhesion characteristics than films produced using other methods. The deposited atoms penetrate the surface, locking the coating to the surface with high adhesion.

The energetic ions created by Cathodic Arc Deposition also allow the use of lower substrate temperatures compared to other processes. This is because the Cathodic Arc Deposition ions carry sufficient energy to form dense, compact films without the need for additional thermal energy to be provided by the substrate.

Cathodic Arc Deposition’s high ionization fraction allows the deposition material to be controlled. For example by biasing the substrate, the impact energy of the ions on the substrate can be increased. The plasma stream can also be rastered using magnetic fields, which allows the deposition material to be moved about the surface, averaging the coating without moving the substrate.   Though, there are disadvantages and problems too. Films may be under high compressive stress, and so-called “macro particles” may be incorporated. The macro particle problem has prevented that cathodic arc plasma deposition is used in high-tech applications – but that may change with the perfection of macro particle filters.

Salient Features of the system:

• Ideal equipment for laboratory equipment in research and short run production
• SS 304 with wall structure for cooling by forced water circulation
• Internal removable shields for easier and faster periodic maintenance
• According to the different coating processes, equipped with dismountable work piece rack and jig, easy operation. 
• Up to 5 Independent mass flow controllers with individual shut off valves. Constant pressure, constant flow and mixed operation modes.
•  The main control system adopts PLC program.HMI touch automatic control, the machine also has a manual operation, and operation and maintenance are very convenient.
• Turbo based pumping system for short cycle time.
• With fast pumping speed, stable vacuum, large loading capacity, and good coating uniformity.
• Precise control of film thickness by adjustable current, by pre-setting to stop after (the required time of deposition), or by external trigger from the customer's system