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Lab Coater Auto306
Versatility for the researcher and the electron microscopist
The HHV Auto306 is a versatile and compact coating system which has been developed to meet the demands of the researcher and electron microscopist.
With its full range of vacuum systems, chamber and modular process accessories the Auto306 offers a range of techniques to complement the modern laboratory.Auto306 is available with glass bell jar and glass cylinder chamber options. Also available is the versatile FL400 front-loading box chamber which provides additional height and width for the fitting of extra process accessories.
Customers can specify from a wide range of modular process accessories which include thermal resistance sources and power supplies, the 3kW EB3 electron beam source, source shutters, work holders and film thickness monitors.
The vacuum system is controlled and monitored by a rugged PLC with touch screen for easy operation. Pumping options include diffusion, turbo and cryo pumps with oil-sealed or dry scroll backing pumps. An integrated high vacuum valve with backup battery protects pumps and samples.
Details
- Features
- Accessories
-
Vacuum systems
- 600l/s diffusion pump
- 250l/s turbo molecular pump
- 500l/s turbo molecular pump
- 14.3m3/h oil sealed rotary pump and liquid nitrogen trap as standard.
- Options for dry scroll pump and mag-lev turbo molecular pump
Chambers
- Domed glass bell jar with optional bell jar lift
-
Glass cylinder with aluminium top plate and optional
top plate counterbalance -
FL400 front loading ‘box’ chamber with 100mm
diameter viewport and chamber liners
Controls and safety
- PLC system controller with touch-screen for vacuum system control
- Automatic high vacuum valve protects pumps and process
- Comprehensive interlocks to maximise operator safety
- The Auto306 carries the CE mark
Future upgrades
-
A feature of the modular design of the Auto306 is that
the system can be re-configured or upgraded
with additional accessories as requirements change
over time.
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- Glass bell jar, glass cylinder or stainless steel box chamber options
- Single or multiple resistance sources
- Four position turret resistance source
- EB3 compact 3kW, four-pocket electron beam source
- Temperature controlled sources for organic electronic materials
- Combination electron beam and resistance evaporation systems
- Static and rotary work holders Substrate heating systems
- Source shutters Glow discharge cleaning
- Film thickness monitoring
We are also pleased to discuss customised solutions for those users who have more exacting requirements.
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