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Lab Coater Auto500

The multi-purpose deposition system for Research & Development


Auto500 is a versatile front-loading coating system with box chamber for research & development or pre-production applications. The chamber accommodates large diameter substrates and allows a range of resistance evaporation, electron beam and sputter processes to be performed without breaking vacuum.

The front-loading chamber is mounted on a pedestal which also houses the vacuum system. A rugged PLC is used to control the vacuum while a full-height 19” equipment rack places the PLC screen and process accessory controls within easy reach of the operator.

The Auto500 can be configured with a single source or for multiple sources of different types to provide the user with great flexibility. The system can be upgraded with more or different accessories as requirements change.

The range of deposition sources is complemented by a range of work holders which provide for sample rotation, high-temperature heating and substrate bias.

A range of diffusion, turbo-molecular and cryo pumps is available to suit the widest range of requirements. Auto500 is also available with dry pumps for oil-free vacuum.


Details

  • Features
  • Application
  • Accessories
  • Large box chamber (500 mm diameter x 500 mm high)
    Front-loading for easy access into the chamber
    Extra feedthrough holes built into the side wall for extra process monitoring,  Residual Gas Analyzers and other accessories
    Standard Diffusion, Turbo, Cryo pumping options
    Rack panel provides space for thin accessories and power supplies


  • Anti-reflective coatings
    Semiconductors
    Mirrors
    Dielectrics
    Organics/polymers & OLEDs
    Photonics research
    Compound semiconductors
    Solar cells
    Nanotechnology


    • 400mm wide and 500mm wide stainless steel box chambers with options for water cooling
    • Glass bell jar or glass cylinder chambers
    • Single or multiple resistance sources, four position turret resistance source
    • 3kW or 6kW multi-pocket electron beam source
    • Static and rotary work holders
    • High temperature substrate heating systems
    • Source shutters and substrate shutters
    • Glow discharge cleaning
    • Film thickness monitoring and control systems
    • Load lock options

Product Gallery

  • Vacuum coater Model Auto 500

  • Interior of FL400 chamber showing EB3 electron beam source, two resistance sources and quartz lamp substrate heater

  • The EB3 compact 3kW electron beam source with turret and liner options .

  • FL500 chamber with three, 3” diameter sputter sources with tilting heads

  • Interior of FL500 chamber showing EB3 electron beam source plus two 75mm magnetron sputtering sources

  • Control rack of a typical Auto500 DC and RF sputter deposition system



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T: +91 80 66703700

F: + 91 80 66703800

E: info@hhv.in , sed@hhv.in

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